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WAFER CLEANER 977, 977L

Streamlined and effective cleaning solutions to bolster your operations. The ADT 977 Wafer Cleaner Systems are meticulously crafted for the purpose of cleaning workpieces subsequent to the dicing process.

Equipped with adjustable rotating cleaning arm with atomizing or high pressure cleaning nozzles to cope with wide range of cleanliness requirements

RELATED DOCUMENTS

FEATURES & BENEFITS​

  • Atomizing/ High pressure cleaning
  • Automatic lid closing
  • Intuitive control panel
  • Process monitoring
  • Compact design
  • Robust, vibration-free
  • Environmentally friendly
  • Programmable sequence control

TECHNICAL SPECIFICATIONS

977- 200977L - 300
Max workpiece sizeØ 8" Ø 12" or 12"x12" square
Cleaning methodAtomizing cleaning/
High pressure cleaning
Atomizing cleaning/
High pressure cleaning
Number of recipes that can be saved2020
Spinner velocity range200–3000 rpm200–2500 rpm
Machine dimensions (WxDxH)410 x 625 x 946 mm570 x1250 x 1073 mm
Approx. machine weight120 kg200 kg

OPTIONS

  • CO2 injection
  • Water resistivity monitoring
  • Ionizer
  • Surfactant additional nozzle and tank
  • Tape-less cleaning
  • Built in exhaust blower
  • Special customized solutions